Atomic Layer Deposition for R&D

Atomic Layer Deposition for R&D

https://www.zldtechnology.com/ald/

1.  Compact, quiet, user-friendly

2.  Uniform and controllable ALD

3.  Sample loading of 4/6 Inch or gram-level powder

4.  Full automated human-machine operation interface

5.  4 sets of quick-release precursor modules, wafer drawer loading

6.  Optimal R&D solution for advanced energy materials and novel nanomaterials

Material Compatibility:

Oxides: Al₂O₃, SiO₂, TiO₂, ZnO, ZrO₂, HfO₂, Ta₂O₅, MgO, etc.

Nitrides: AlN, TiN, ZrN, HfN, WN

Metals: Ru, Pd, Pt, Ni, Co, W

Sulfides: MoS₂, WS₂, ZnS, TiS₂